Zeus represents the industrial INGENIA p3e cathodic arc batch coating system at MCh. The machine is equipped with six cathodes and two ion sources at different positions in the 60x60x70 cm vacuum chamber. Nitride and oxide coatings can be synthesized from Ti, Cr, TiAl (50:50), AlTi (67:33), AlTi (90:10), AlTi (95:05), AlCr (70:30), AlCr (50:50), AlZr (70:30), AlZr (90:10) and AlZr (95:05) targets in reactive atmosphere with up to 8 Pa deposition pressure. Two carousels can be used to mount technical substrates (cemented carbide, steel) or wafers (silicon, sapphire). Substrate cleaning is done by plasma etching from the ion sources. The maximum temperature of < 600°C is achieved by combining radiation and plasma heating. Each target is evaporated with one power supply and substrate bias (DC, unipolar, bipolar) is used for ion bombardment.

• MCh ID no.: 4.3_02
• Nickname: Zeus
• Person in charge: Marcus Hans

• Installed: 2013
• No. of targets: 6
• Substrate Bias: yes

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