Jarvis
Jarvis is a self-manufactured PVD system designed for the synthesis of thickness graded multilayer thin films. The most unique features are the fast acting target shutter. An actuation time (from open to close or from close to open) of 200 ms enables the synthesis of thin multilayers down to monolayer thicknesses. Two of the targets are aligned 45° relative to the substrate normal, which enables the growth of thickness graded films. The third target is aligned head on to the substrate. The main chamber is equipped with a self-build lamp heater, which is mounted on a former 2’’ Besteck substrate manipulator. A load lock system allows for efficient, clean and high throughput synthesis.
- MCh ID no.: 4.1_07
- Nickname: Jarvis
- Inventory number: (fill only if known)
- Person in charge: Eva Mayer, Sameer Salman
Machine data
- Built: 2015
- No. of targets: 3
- Substrate bias: yes
- HPPMS compatible: yes
Standard equipment
- Old Attis chamber as a load-lock system
- Shutter MBE
- Self-build lamp heater (intended max T=1000°C)
- Three self-build 2’’ Magnetrons version No[]
- Transfer rod version No.[]
- NO standard power generator available (Jan 2016)
- compatible with MELEC Pulse Generators
- compatible with PMP1 generators from Kybele
- Main chamber:
- Turbovac 350i Qerlikon Leybold
- Trivac D4B Oerlikon Leybold
- Load-lock:
- Turbovac 151 Oerlikon Leybold
- Ilmvac P6Z
- Main chamber and load lock cold cathode PTR 90 Oerlikon Leybold
- Main chamber capacitance pressure gauge CTR 101 range 0.1 Torr Oerlikon Leybold
- Main chamber pre vacuum Pirani pressure gauge TTR 91N Oerlikon Leybold