Differences

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--- mchequip:4.2_02 [2024/07/15 10:17] – created fecik
+++ mchequip:4.2_02 [2024/09/03 15:43] (current) – fecik
@@ Line 2: / Line 2: @@
 FIXME
-  * MCh ID no.: 4.3_02
-  * Nickname: Zeus
-  * Person in charge: Marcus Hans
 Zeus represents the industrial Oerlikon Balzers INGENIA p3e cathodic arc batch coating system at MCh and p3e is the abbreviation for pulse enhanced electron emission. The machine is equipped with six cathodes and two ion sources at different positions in the 60x60x70 cm vacuum chamber.
@@ Line 31: / Line 27: @@
   * Each target is evaporated with one power supply and substrate bias (DC, unipolar, bipolar) is used for ion bombardment.
+----
+  * MCh ID no.: 4.2_02
+  * Nickname: Zeus (Ingenia)
+  * Inventory number: (fill only if known)
+  * Person in charge: Marcus Hans
 === Machine data ===
@@ Line 36: / Line 38: @@
   * Installed: 2013
   * No. of targets: 6
-  * Substrate Bias: yes
+  * Substrate bias: yes
+  * HPPMS compatible:
+{{ mchequip:zeus.jpeg?nolink&0x350 |Zeus}}
+=== Standard equipment ===
+  * equipment 1
+  * equipment 2
 === Documentation ===
-Ingenia User Manual
+{{mchequip:ingeniausermanual.pdf|Ingenia User Manual}} \\
-https://134.130.64.55/dokuwiki/lib/exe/fetch.php?media=blog:ingeniausermanual.pdf
+{{mchequip:sparepartscatalog.pdf|Spare Parts Catalog}}
-Spare Parts Catalog
-https://134.130.64.55/dokuwiki/lib/exe/fetch.php?media=blog:sparepartscatalog.pdf
+[[mchequip:status|See current status and issues]] \\
 [[mchequip:deposition|Back to the list]]