Differences

This shows you the differences between two versions of the page.

--- mchequip:4.2_01 [2024/07/15 10:17] – created fecik
+++ mchequip:4.2_01 [2024/09/03 15:31] (current) – fecik
@@ Line 1: / Line 1: @@
-===== Template: Name of the chamber =====
+===== Thor =====
 FIXME
@@ Line 5: / Line 5: @@
 Please give a short description of the chamber including the kind of deposition system, the origin and use. You may also fill out the following bullet points.
-  * MCh ID no.:
+  * MCh ID no.: 4.2_01
-  * Nickname:
+  * Nickname: Thor
-  * Person in charge:
+  * Inventory number: (fill only if known)
+  * Person in charge: Stanislav Mráz
 === Machine data ===
@@ Line 13: / Line 14: @@
   * Built:
   * No. of targets:
-  * Substrate Bias:
+  * Substrate bias:
   * HPPMS compatible:
-=== Standard equipment ===
+{{ mchequip:thor.jpeg?nolink&0x350 |Thor}}
-Please list here the standard equipment used for this device. The given example below is made for Kybele.
+=== Standard equipment ===
-  * MELEC Pulse Generators
+  * equipment 1
-  * Mass Energy Analyzer
+  * equipment 2
-  * SURFACE Sample holder/heater
-  *
 === Documentation ===
@@ Line 29: / Line 28: @@
 Please write down a short MCh User manual or upload scans.
+[[mchequip:status|See current status and issues]] \\
 [[mchequip:deposition|Back to the list]]