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mchequip:4.1_08 [2024/07/15 10:15] – created fecikmchequip:4.1_08 [2024/09/03 15:28] (current) fecik
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 Please give a short description of the chamber including the kind of deposition system, the origin and use. You may also fill out the following bullet points. Please give a short description of the chamber including the kind of deposition system, the origin and use. You may also fill out the following bullet points.
  
-  * MCh ID no.:  +  * MCh ID no.: 4.1_08 
-  * Nickname:  +  * Nickname: Dino 
-  * Person in charge: +  * Inventory number: (fill only if known) 
 +  * Person in charge: Stanislav Mráz
  
 === Machine data === === Machine data ===
Line 13: Line 14:
   * Built:    * Built: 
   * No. of targets:    * No. of targets: 
-  * Substrate Bias+  * Substrate bias
   * HPPMS compatible:    * HPPMS compatible: 
  
 === Standard equipment === === Standard equipment ===
  
-Please list here the standard equipment used for this device. The given example below is made for Kybele. +  * equipment 1 
- +  * equipment 2
-  * MELEC Pulse Generators +
-  * Mass Energy Analyzer +
-  * SURFACE Sample holder/heater +
-  * +
  
 === Documentation === === Documentation ===
  
-Please write down a short MCh User manual or upload scans.+Current documentation (as of September 2024) can be found on the institute's file server: 
 +<code> 
 +K:\Organization\General organization data\MCh Infrastructure\Manuals and information\EQUIPMENT MANUALS\Hippo 
 +</code>
  
 +[[mchequip:status|See current status and issues]] \\
 [[mchequip:deposition|Back to the list]] [[mchequip:deposition|Back to the list]]
mchequip/4.1_08.1721031355.txt.gz · Last modified: 2024/07/15 10:15 by fecik