Differences

This shows you the differences between two versions of the page.

--- mchequip:4.1_02 [2024/09/03 12:02] – fecik
+++ mchequip:4.1_02 [2024/09/03 14:19] (current) – fecik
@@ Line 3: / Line 3: @@
 FIXME
-Please give a short description of the chamber including the kind of deposition system, the origin and use. You may also fill out the following bullet points.
+A short description of the chamber including the kind of deposition system,
+the origin and use.
-  * MCh ID no.:
+  * MCh ID no.: 4.1_0.2
   * Nickname:
-  * Person in charge:
+  * Inventory number: (fill only if known)
+  * Person in charge:
-=== Machine data ===
+=== Instrument data ===
   * Built:
   * No. of targets:
   * Substrate Bias:
   * HPPMS compatible:
+{{ mchequip:lassie.jpeg?nolink&0x350 |Lassie}}
 === Standard equipment ===
-Please list here the standard equipment used for this device. The given example below is made for Kybele.
+List of standard equipment used for this device.
-  * MELEC Pulse Generators
+  * equipment 1
-  * Mass Energy Analyzer
+  * equipment 2
-  * SURFACE Sample holder/heater
-  *
 === Documentation ===
-Please write down a short MCh User manual or upload scans.
+Please write down a short MCh user manual or upload corresponding scans.
 [[mchequip:status|See current status and issues]] \\
 [[mchequip:deposition|Back to the list]]