Differences

This shows you the differences between two versions of the page.

--- blog:4.2_02 [2024/05/21 13:17] – fecik
+++ blog:4.2_02 [2024/07/15 10:17] (current) – removed fecik
@@ Line 1: / Line 1: @@
-===== Zeus =====
-FIXME
-  * MCh ID no.: 4.3_02
-  * Nickname: Zeus
-  * Person in charge: Marcus Hans
-Zeus represents the industrial Oerlikon Balzers INGENIA p3e cathodic arc batch coating system at MCh and p3e is the abbreviation for pulse enhanced electron emission. The machine is equipped with six cathodes and two ion sources at different positions in the 60x60x70 cm vacuum chamber.
-Nitride and oxide coatings can be synthesized from
-  * Ti,
-  * Cr,
-  * TiAl (50:50),
-  * AlTi (67:33),
-  * AlTi (90:10),
-  * AlTi (95:05),
-  * AlCr (70:30),
-  * AlCr (50:50),
-  * AlZr (70:30),
-  * AlZr (90:10), and
-  * AlZr (95:05)
-targets in reactive atmosphere with up to 8 Pa deposition pressure.
-Other specifications:
-  * Two carousels can be used to mount technical substrates (cemented carbide, steel) or wafers (silicon, sapphire).
-  * Substrate cleaning is done by plasma etching from the ion sources.
-  * The maximum temperature of < 600°C is achieved by combining radiation and plasma heating.
-  * Each target is evaporated with one power supply and substrate bias (DC, unipolar, bipolar) is used for ion bombardment.
-=== Machine data ===
-  * Installed: 2013
-  * No. of targets: 6
-  * Substrate Bias: yes
-=== Documentation ===
-Ingenia User Manual
-https://134.130.64.55/dokuwiki/lib/exe/fetch.php?media=blog:ingeniausermanual.pdf
-Spare Parts Catalog
-https://134.130.64.55/dokuwiki/lib/exe/fetch.php?media=blog:sparepartscatalog.pdf
-[[blog:deposition|Back to the list]]