blog:4.1_06
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| - | ===== Garfield ===== | + | |
| - | Garfield is a self-manufactured PVD system consisting of two parts, a deposition and a loadlock chamber. | + | |
| - | \\ | + | |
| - | \\ | + | |
| - | MCh ID no.:\\ | + | |
| - | Nickname: Garfield\\ | + | |
| - | Person in charge: Jan-Ole Achenbach\\ | + | |
| - | \\ | + | |
| - | **Machine data**\\ | + | |
| - | \\ | + | |
| - | Built: ...\\ | + | |
| - | Max no. of targets: 3\\ | + | |
| - | Substrate Bias: yes\\ | + | |
| - | HPPMS compatible: yes\\ | + | |
| - | \\ | + | |
| - | ==== Standard equipment ====\\ | + | |
| - | \\ | + | |
| - | SURFACE Sample holder/ | + | |
| - | \\ | + | |
| - | ==== Documentation ====\\ | + | |
| - | \\ | + | |
| - | **MCh User manual Cathode user manuals** | + | |
blog/4.1_06.1452755878.txt.gz · Last modified: 2016/01/14 06:17 (external edit)